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《等离子体科学与技术:英文版》
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2000年3期
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XPS Analysis of α-B/C:H Film Deposited by ICRF Boronization
XPS Analysis of α-B/C:H Film Deposited by ICRF Boronization
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摘要
未填写
DOI
pj0xxllxjy/1044003
作者
曾敏;张晓东;辜学茂
机构地区
不详
出处
《等离子体科学与技术:英文版》
2000年3期
关键词
分类
[核科学技术][核技术及应用]
出版日期
2000年03月13日(中国期刊网平台首次上网日期,不代表论文的发表时间)
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来源期刊
等离子体科学与技术:英文版
2000年3期
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