学科分类
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5 个结果
  • 简介:SupersonicMolecularBeamInjection(SMBI)isanewfuellingmethodforTokamaksandhasrecentlybeenimprovedtoenhancethefluxofthebeamandtomakeasurveyoftheclustereffectwithinthebeam.Thereareaseriesofnewphenmnena,whichimplicatetheinteractionofthebeam(includingclusters)withthetoroidalplasmaofHiL-1MTokamak.TheHαsignalsfromtheedgeshowaregularvariationaroundthetorus.Aroundtheinjectionport,theedgeHαsignalsarepositiverectangularwave,whichisconsistentwiththatoftheinjectionbeampulses.Theedgeelectrontemperature,measuredwithmovableLangmuirprobes,decreasesbyanorderofmagnitudeandthedensityincreasesbyanorderofmagnitude.Hαemissionatthebeaminjectionport,measuredwithCCDcameraatanangleof13.4degreestotheSMBIline,showsmanyseparatepeakswithinthecontourplot.Thesepeaksmayshowthestrongemissionproducedbytheinteractionofthehydrogenclusterswiththeplasma.Hydrogenclustersmaybeproducedinthebeamaccordingtotheempiricalscaling(Hagena)lawofclusteringonset,heredisthenozzlediameterinμm,P0thestaguationpressureinmbar,T0thesourcetenperatureinK,andkisaconstantrelatedtothegasspecies.IfΓ*>100,clusterswillbeformed.InpresentexperimentΓ*isabout127.

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  • 简介:MoleculardynamicssimulationsareperformedtoinvestigateCF3continuouslybom-bardingtheamorphoussiliconsurfacewithenergiesof10eV,50eV,100eVand150eVatnormalincidenceandroomtemperature.TheimprovedTersoff-Brennerpotentialswereused.Thesimu-lationresultsshowthatthesteady-stateetchingratesareabout0.019,0.085and0.1701for50eV,100eVand150eV,respectively.Withincreasingincidentenergy,atransitionfromC-richsurfacetoF-richsurfaceisobserved.IntheregionmodifiedbyCF3,SiFandCFspeciesaredominant.

  • 标签: 分子动力学模拟 CF3 蚀刻率 硅刻蚀 机理 表面能量
  • 简介:Synchrontronradiationx-rayreflectivitymeasurementisusedtostudytheconcentrationprofileofaδ-dopedErlayerinSiepitaxialfilmgrownbymolecular-beamepitaxy.Theoscillationofthereflectivityamplitudeasafunctionofreflectionangleisobservedintheexperiment.Bydoingatheoreticalsimulation.theconcentrationprofileofEratomscouldbederied.Itisshownthattheoriginallygrownδ-dopedErlayerchangesintoanexpionentiallydecayedfunctionduetotheErsegregation.Thetemperaturedependenceofthe1/edecaylengthindicatesthatthesegregationisakineticallylimitedprocess.Theactivationenergyisdeterminedtobe0.044±0.005eV.

  • 标签: 硅外延薄膜 铒掺杂 同步辐照 X射线反射率
  • 简介:WereportonastudyofinterfacialstructureofGaNfilmsgrownonGaAs(001)substratesbyplasma-assistedmolecularbeamepitaxyusingx-raygrazing-anglespecularreflection.WeshowthatinterfaciallayerswithelectrondensitiesdifferingfromthoseofGaNandGaAswereformedupondepositionofGaN.Itisalsofoundthattheinterfacialstructureofoursystemsdependsstronglyonthecourseoftheinitiallayerdeposition.ThephasepurityoftheGaNfilmswasexaminedbyx-rayreciprocalspacemapping.Asimplekineticgrowthmodelsuggestedbyourresultshasbeenpresented.

  • 标签: GAN薄膜 分子束外延生长 X射线衍射 实验研究