简介:Asmall-anglex-rayscattering(SAXS)techniqueusingsynchrotronradiationasthex-raysourcehasbeenemployedtocharacterizethemicrostructureofmesoporoussilicapreparedbyone-pottemplate-directedsynthesismethodology.ThescatteringofpuresilicaagreedwithPorod’slaw.thescatteringoforganomodifiedmesoporoussilicashowedanegativedeviationfromPorod’slaw,suggestingthataninterfaciallayerexistsbetweentheporesandsilicamatrix.Itwastheorganicgroupscomprisingtheinterface,asshownby^29Sicross-polarizationmagic-anglespinningnuclearmagneticresonanceimaging(^29SicpMAS/NMR)andFouriertransforminfraredspectroscopy(FTIR),thatcausedthisnegativedeviationofSAXSintensityfromPorod’slaw,andtheaveragethichnessoftheinterfaciallayercouldbededucedfromthisnegativedeviation.Copyright2001johnWileyandSons,Ltd.
简介:Small-angleX-rayscattering(SAXS)usingsynchrotronradiationasX-raysourcehasbeenemployedtocharactcizcthemicroscopicstructrureoforgano-modifiedmesoporousmolecularsieves(organo-MSU-X)preparedbyaone-pottemplate-directedsynthesis.ItisshownthattheSAXSprofileishardlyconstantwithPorod’slawshowinganegativeslope,i.e.,negativedeviation.Thissuggeststhatthereisdiffuseinterfaciallayerlocatedbetweentheporesandthematrix.Thissuggeststhattheorganicgroupsremaincovalentlylinkedtothematrix,asindicatedby^29SiCPMASNMRandFT-IR.Theaveragethicknessoftheinterfaciallayerwasfoundtobeabout1nmforeachofthethreesampleswithdifferentkindsandthesameamounts(20?oforganicgroups.Thiskindofmaterialhasalsobeenprovedtopossessbothsurfaceandmassfractalstructureoftheamophousporoussilicamaterials.2001ElsevierScienceB.V.Allrightsreserved.