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2000年2期
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Deposition of Diamond Films on Copper Substrate
Deposition of Diamond Films on Copper Substrate
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摘要
未填写
DOI
odwqq9xydk/1044056
作者
马志斌;邬钦崇;舒兴胜;汪建华;王传新;黎向锋
机构地区
不详
出处
《等离子体科学与技术:英文版》
2000年2期
关键词
分类
[核科学技术][核技术及应用]
出版日期
2000年02月12日(中国期刊网平台首次上网日期,不代表论文的发表时间)
相关文献
1
YANGGuowei;MAOYude.
Dependence of surface morphology of CVD diamond films on deposition conditions
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.物理,2002-10.
5
刘沙;易丹青;等.
Physical Properties of Diamond Coatings on a WC—6% Co Substrate
.物理,2002-03.
6
张春梅;郑艳彬;姜志刚;吕宪义;侯雪;胡双;刘军伟.
Effect of CO2 Addition on Preparation of Diamond Films by Direct-Current Hot-Cathode Plasma Chemical Vapor Deposition Method
.物理,2010-08.
7
CHEN Chao GUO Hong CHU Ke YIN Fazhang ZHANG Ximing HAN Yuanyuan FAN Yeming.
Thermal conductivity of diamond/copper composites with a bimodal distribution of diamond particle sizes prepared by pressure infiltration method
.金属材料,2011-04.
8
ZHONGBo-qiang.
Deposition of Silicon Nitride Films by Silane Hydrazine Process
.物理电子学,1999-02.
9
WANG Ting-ting;HE Zhi-qun;ZHENG Xiao-pan;WANG Yong-sheng;ZHANG Chun-xiu;ZHANG Wen-guan.
Electrical properties of Copper(Ⅱ) phthalocyanine derivative thin films
.物理电子学,2007-01.
10
舒兴胜;邬钦崇.
Influence of Microwave Power Supply on the Quality of MWPCVD Diamond Films
.核技术及应用,2000-02.
来源期刊
等离子体科学与技术:英文版
2000年2期
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